Showerhead-enhanced inertial particle deposition in parallel-plate reactors

Aerosol Science and Technology

Volumn 28, Issue 2, 1998, Pages 105-132

  Rader, Daniel J ^a   Geller, Anthony S ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; COMPUTATIONAL METHODS; FINITE ELEMENT METHOD; FLOW PATTERNS; MATHEMATICAL MODELS; PARTICLES (PARTICULATE MATTER); POROSITY; REYNOLDS NUMBER; TRANSPORT PROPERTIES;

CREEPING-FLOW APPROXIMATION; PARALLEL-PLATE REACTORS; PARTICLE DRIFT VELOCITY; SHOWERHEAD-ENHANCED INERTIAL PARTICLE DEPOSITION; STOKES NUMBER;

ATMOSPHERIC AEROSOLS;

DEPOSITION; FLUID FLOW; MATHEMATICAL MODELING; PARTICLE;

AIRBORNE PARTICLE; ARTICLE; GAS FLOW; GEOMETRY; MATHEMATICAL MODEL; PRIORITY JOURNAL; SEMICONDUCTOR; VELOCITY;

EID: 0032005937     PISSN: 02786826     EISSN: 15217388     Source Type: Journal    
DOI: 10.1080/02786829808965515     Document Type: Article

References (33)

1. Bae, G.-N., Lee, C. S., and Park, S. O. (1994). Measurement of Particle Deposition Velocity toward a Horizontal Semiconductor Wafer by Using a Wafer Surface Scanner, Aerosol Sei. Technol. 21:72-82.
2. Bird, R. B., Stewart, W. E., and Lightfoot, E. N. (1960). Transport Phenomena, J. Wiley and Sons, New York.
3. Bowling, R. A., and Larrabee, G. B. (1989). Behavior and Detection of Particles in Vacuum Processes, J Electrochem. Soc. 136(2):497-502.
4. Busnaina, A., Zheng, X., and Zhu, X. (1993). Three-Dimensional Computer Simulation of Gas Flow and Particle Transport in a Horizontal Diffusion Furnace, J. Inst. Environ. Sei. 36(2):25-32.
5. Coltrin, M. E., Kee, R. J., Evans, G. H., Meeks, E, Rupley, F. M., and Grcar, J. F. (1991). SPIN (Version 3.83): A Fortran Program for Modeling One-Dimensional Rotating-DiskJStagnation-Flow Chemical Vapor Deposition reactors, Sandia Internal Report SAND91-8003, Sandia National Laboratories, Albuquerque, NM.
6. Cooper, D. W. (1986). Particulate Contamination and Microelectronics Manufacturing: An Introduction, Aerosol Sei. Technol. 5:287-299.
7. Cooper, D. W., Miller, R. J., Wu, J. J., and Peters, M. H. (1990). Deposition of Submicron Aerosol Particles During Integrated Circuit Manufacturing: Theory, Part. Sei. Technol. 8:209-224.
8. Cooper, D. W., Peters, M. H., and Miller, R. J. (1991). Predicted Deposition of Submicrometer Particles Due to Diffusion and Electrostatics in Viscous Axisymmetric Stagnation-Point Plow. Aerosol Sei. Technol. 11:133-143.
9. Donovan, R. P., Yamamoto, T., Periasamy, R., and Clayton, A. C. (1993). Mechanisms of Particle Transport in Process Equipment, J. Electrochem. Soc. 140(10):2917-2922.
10. Epstein, P. S. (1924). On the Resistance Experienced by Spheres in Their Motion through Gases, Phys. Rev. 23:710-733.
11. Evans, G. H., and Greif, R. (1987a). A Numerical Model of the Flow and Heat Transfer in a Rotating Disk Chemical Vapor Deposition Reactor, J. Heat Transfer 109:928-935.
12. Evans, G. H., and Greif, R. (1987b). Effects of Boundary Conditions on the Flow and Heat Transfer in a Rotating Disk Chemical Vapor Deposition Reactor, Numerical Heat Transfer 12:243-252.
13. Evans, G. H., and Greif, R. (1988). Forced Flow Near a Heated Rotating Disk: A Similarity Solutions, Numerical Heat Transfer 14:373-387.
14. Friedlander, S. K. (1977). Smoke, Dust and Haze, J. Wiley and Sons, New York.
15. Hinds, W. C. (1982). Aerosol Technology, J. Wiley and Sons, New York.
16. Houtman, C., Graves, D. B., and Jensen, K. F. (1986). CVD in Stagnation Point Flow: An Evaluation of the Classical ID Treatment, J. Electrochem. Soc. 133(5):961-970.
17. Liu, B. Y. H., and Ahn, K-h. (1987). Particle Deposition on Semiconductor Wafers, Aerosol Sei. Technol. 6:215-224.
18. Marple, V. A. and Liu, B. Y. H. (1975). On Fluid Flow and Aerosol Impaction in Inertial Impac-tors, J. Colloid Interface Sei. 53(l):31-34.
19. Marple, V. A. and Liu, B. Y. H. (1974). Characteristics of Laminar Jet Impactors, Environ. Sei. Technol. 8(7):648-654.
20. Otani, Y., Emi, H., Kanaoka, C., and Kato, K. (1989). Determination of Deposition Velocity onto a Wafer for Particles in the Size Range between 0.03 and 0.8 Jxm, J. Aerosol Sei. 20(7): 787-796.
21. Periasamy, R., Yamamoto, T., Donovan, R. P., and Clayton, A. C. (1993). Particle Transport at Subatmospheric Pressures: Models and Verification, J. Electrochem. Soc. 140(10):2949-2951.
22. Peters, M. H., and Côoper, D. W. (1991). Approximate Analytic Solutions for Particle Deposition in Viscous Stagnation-Point Flow in the Inertial-Diffusion Regime with External Forces, J. Colloid and Interface Sei. 142(1):140-148.
23. Peters, M. H., Cooper, D. W., and Miller, R. J. (1989). The Effects of Electrostatic and Inertial Forces on the Diffusive Deposition of Small Particles onto Large Disks: Viscous Axisym-metric Stagnation Point Flow Approximations, J. Aerosol Sei. 20(1):123-136.
24. Rader, D. J. (1990). Momentum Slip Correction Factor for Small Particles in Nine Common Gases, J. Aerosol Sei. 21(2): 161-168.
25. Rader, D. J., and Gelier, A. S. (1994). Particle Transport Modeling in Semiconductor Process Environments, Plasma Sources Sei. Technol. 3: 426-432.
26. Rader, D. J., and Geller, A. S. (1998). Particle Transport in Parallel Plate Reactors, Sandia National Laboratories Internal Report SAND98-8202, Albuquerque, New Mexico (in preparation).
27. Rader, D. J., Geller, A. S., Choi, S. J., and Kush-ner, M. J. (1994a). Application of numerical Models to Predict Particle Contamination in Semiconductor Process Environments, in 1994 Proceedings of the Institute of Environmental Sciences 40th Technical Meeting, pp. 308-315.
28. Rader, D. J., Geller, A. S., Choi, S. J., and Kush-ner, M. J. (1994b). Particle Transport in Plasma Reactors, Microcontamination 94 Conference Proceedings, pp. 39-48.
29. Rader, D. J., and Marple, V. A. (1985). Effect of Ultra-Stokesian Drag and Particle Interception on Impaction Characteristics, Aerosol Sei. Technol. 4:141-156.
30. Ramarao, B. V., and Tien, C. (1989). Aerosol Deposition in Two-Dimensional Laminar Stagnation Flow, J. Aerosol Sei. 20(7):775-785.
31. Talbot, L., Cheng, R. K., Schefer, R. W., and Willis, D. R. (1980). Thermophoresis of particles in a heated boundaiy layer, J. Fluid Mech. 101(4):737-758.
32. Terrill, R. M., and Cornish, J. P. (1973). Radial Flow of a Viscous, Incompressible Fluid between Two Stationary, Uniformly Porous Discs, J. Appl. Math. Phys. (ZAMP) 24:676-688.
33. Waldmann, L., and Schmitt, K. H. (1966). Ther-mophoresis and Diffusiophoresis of Aerosols, in Aerosol Science (C. N. Davies, ed.), Academic Press, New York, 137-162