An integrated self-masking technique for providing low-loss metallized RF MEMS devices in a polysilicon only MEMS process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5836, Issue , 2005, Pages 138-152

  Wilson, John M ^a   Bashirullah, Rizwan ^b   Nackashi, David P ^a   Winick, David A ^a   Franzon, Paul D ^a  

^a North Carolina State University   (United States)

^b UNIVERSITY OF FLORIDA   (United States)

Author keywords

Metallization; Post process; Removable mask; RF MEMS; SUMMiT; Tunable capacitor

Indexed keywords

CAPACITANCE; CAPACITORS; LASER TUNING; METALLIZING; MICROPROCESSOR CHIPS; POLYSILICON;

POST PROCESS; REMOVABLE MASK; RF MEMS; SUMMIT; TUNABLE CAPACITOR;

MICROELECTROMECHANICAL DEVICES;

EID: 28344455106     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.607592     Document Type: Conference Paper

References (6)

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