Semiconductor gas sensor based on tin oxide nanorods prepared by plasma-enhanced chemical vapor deposition with postplasma treatment

Applied Physics Letters

Volumn 87, Issue 16, 2005, Pages 1-3

  Huang, Hui ^a   Tan, O K ^a   Lee, Y C ^a   Tran, T D ^a   Tse, M S ^a   Yao, X ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SENSORS; ELECTRIC SPACE CHARGE; GRAIN SIZE AND SHAPE; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PLASMA THEORY; TIN COMPOUNDS;

PLASMA TREATMENTS; TIN OXIDE NANORODS;

SEMICONDUCTOR MATERIALS;

EID: 28344447053     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2106006     Document Type: Article

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