Contactless measurement of electrical conductivity of Si wafers independent of wafer thickness

Applied Physics Letters

Volumn 87, Issue 16, 2005, Pages 1-3

  Ju, Yang ^a   Hirosawa, Yo ^a   Soyama, Hitoshi ^a   Saka, Masumi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; MICROWAVES; SEMICONDUCTOR MATERIALS;

MICROWAVE INSTRUMENT; SEMICONDUCTOR WAFERS; WAFER THICKNESS;

SILICON WAFERS;

EID: 28344432485     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2105992     Document Type: Article

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