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Volumn 49, Issue 12, 2005, Pages 1965-1968

A new partial SOI power device structure with P-type buried layer

Author keywords

Additional electric field modulation; BPSOI; Breakdown voltage; Specific on resistance

Indexed keywords

ELECTRIC CHARGE; ELECTRIC FIELD EFFECTS; ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; SEMICONDUCTOR JUNCTIONS; SURFACE PHENOMENA;

EID: 28044436736     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2005.09.012     Document Type: Article
Times cited : (60)

References (8)
  • 1
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    • Comparison of self-heating effects in bulk-silicon and SOI high-voltage devices
    • Arnold E, Pein H, Herko SP. Comparison of self-heating effects in bulk-silicon and SOI high-voltage devices. In: Proc IEDM, 1994. p. 813-6.
    • (1994) Proc IEDM , pp. 813-816
    • Arnold, E.1    Pein, H.2    Herko, S.P.3
  • 3
    • 0026403124 scopus 로고
    • Realization of high breakdown voltage (>700 V) in thin SOI devices
    • Merchant S, Arnold E, et al. Realization of high breakdown voltage (>700 V) in thin SOI devices. In: Proc ISPSD, 1991. p. 31.
    • (1991) Proc ISPSD , pp. 31
    • Merchant, S.1    Arnold, E.2
  • 4
    • 28044460906 scopus 로고    scopus 로고
    • Breakdown voltage analysis for step buried oxide SOI
    • Baoxing Duan, Bo Zhang, and Zhaoji Li Breakdown voltage analysis for step buried oxide SOI Chin J Semicond 26 7 2005 42 46
    • (2005) Chin J Semicond , vol.26 , Issue.7 , pp. 42-46
    • Baoxing, D.1    Bo, Z.2    Zhaoji, L.3
  • 6
    • 2942633298 scopus 로고    scopus 로고
    • Realizing high breakdown voltages (>600 V) in partial SOI technology
    • Ramakrishna Tadikonda, Shyam Hardikar, and E.M. Sankara Narayanan Realizing high breakdown voltages (>600 V) in partial SOI technology Solid-State Electron 48 2004 1655 1660
    • (2004) Solid-State Electron , vol.48 , pp. 1655-1660
    • Ramakrishna, T.1    Shyam, H.2    Sankara Narayanan, E.M.3
  • 7
    • 0026926744 scopus 로고
    • Theory of optimum design of reverse-biased p-n junctions using resisted field plates and variation lateral doping
    • X.B. Cheng, B. Zhang, and Z.J. Li Theory of optimum design of reverse-biased p-n junctions using resisted field plates and variation lateral doping Solid-State Electron 35 1992 1365 1370
    • (1992) Solid-State Electron , vol.35 , pp. 1365-1370
    • Cheng, X.B.1    Zhang, B.2    Li, Z.J.3
  • 8
    • 28044469389 scopus 로고    scopus 로고
    • Technology Modeling Associates Inc. Palo Alto, US
    • TMA MEDICI 4.2. Technology Modeling Associates Inc. Palo Alto, US.
    • TMA MEDICI 4.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.