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Volumn 48, Issue 9, 2004, Pages 1655-1660

Realizing high breakdown voltages (>600 V) in partial SOI technology

Author keywords

High voltage; LDMOS; Partial SOI; Power IC; Self heating; VLD

Indexed keywords

COMPUTER SIMULATION; ELECTRIC BREAKDOWN; ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; HEAT LOSSES; POISSON EQUATION; POWER INTEGRATED CIRCUITS; SEMICONDUCTOR DOPING; THICKNESS MEASUREMENT;

EID: 2942633298     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2004.04.005     Document Type: Conference Paper
Times cited : (56)

References (12)
  • 1
    • 0028466825 scopus 로고
    • Silicon-on-insulator devices for high voltage and power IC applications
    • Arnold E. Silicon-on-insulator devices for high voltage and power IC applications. J. Electrochem. Soc. 141(7):1994;1983.
    • (1994) J. Electrochem. Soc. , vol.141 , Issue.7 , pp. 1983
    • Arnold, E.1
  • 2
    • 0028757872 scopus 로고
    • Comparison of self-heating effects in bulk-silicon and SOI high-voltage devices
    • Arnold E, Pein H, Herko SP. Comparison of self-heating effects in bulk-silicon and SOI high-voltage devices. In: Proc IEDM, 1994. p. 813-6.
    • (1994) Proc IEDM , pp. 813-816
    • Arnold, E.1    Pein, H.2    Herko, S.P.3
  • 3
    • 0024641590 scopus 로고
    • Novel silicon-on-insulator MOSFET for high voltage integrated circuits
    • Ratnam P. Novel silicon-on-insulator MOSFET for high voltage integrated circuits. IEEE Electron. Dev. Lett. 25(8):1989;536-537.
    • (1989) IEEE Electron. Dev. Lett. , vol.25 , Issue.8 , pp. 536-537
    • Ratnam, P.1
  • 4
    • 0031371970 scopus 로고    scopus 로고
    • Breakdown analysis in JI, SOI and partial SOI power structures
    • Udrea F, Popescu A, Milne W. Breakdown analysis in JI, SOI and partial SOI power structures. In: Proc IEEE Int SOI Conf, 1997. p. 102-3.
    • (1997) Proc IEEE Int SOI Conf , pp. 102-103
    • Udrea, F.1    Popescu, A.2    Milne, W.3
  • 6
    • 0032672985 scopus 로고    scopus 로고
    • Modelling of self-heating effect in thin SOI and partial SOI LDMOST power devices
    • Lim H.T., Udrea F., Garner D.M., Milne W.I. Modelling of self-heating effect in thin SOI and partial SOI LDMOST power devices. Solid State Electron. 1999;1267-1280.
    • (1999) Solid State Electron. , pp. 1267-1280
    • Lim, H.T.1    Udrea, F.2    Garner, D.M.3    Milne, W.I.4
  • 7
    • 0026403124 scopus 로고
    • Realization of high breakdown voltage (>700 V) in thin SOI devices
    • Merchant S, et al. Realization of high breakdown voltage (>700 V) in thin SOI devices. In: Proc IEEE Int Symp Power Semiconduct ICs, ISPSD'91, 1991. p. 31-5.
    • (1991) Proc IEEE Int Symp Power Semiconduct ICs, ISPSD'91 , pp. 31-35
    • Merchant, S.1
  • 8
    • 0029716645 scopus 로고    scopus 로고
    • High voltage LDMOST transistors in sub-micron SOI films
    • Paul AK, et al. High voltage LDMOST transistors in sub-micron SOI films. In: Proc 8th Int Symp Power Semiconduct ICs, 1996. p. 89-92.
    • (1996) Proc 8th Int Symp Power Semiconduct ICs , pp. 89-92
    • Paul, A.K.1
  • 9
    • 0002396498 scopus 로고
    • Thin layer high-voltage devices (RESURF devices)
    • Appels J.A., et al. Thin layer high-voltage devices (RESURF devices). Philips J. Res. 35:1980;1-13.
    • (1980) Philips J. Res. , vol.35 , pp. 1-13
    • Appels, J.A.1
  • 10
    • 0031236694 scopus 로고    scopus 로고
    • Heating mechanisms of LDMOST and LIGBT in ultra thin SOI
    • Leung Y.-K., et al. Heating mechanisms of LDMOST and LIGBT in ultra thin SOI. IEEE Electron. Dev. Lett. 18(9):1997;414-416.
    • (1997) IEEE Electron. Dev. Lett. , vol.18 , Issue.9 , pp. 414-416
    • Leung, Y.-K.1
  • 11
    • 2942646279 scopus 로고    scopus 로고
    • 'TMA MEDICI 4.0' Technology Modeling Associates Inc., Palo Alto, USA
    • 'TMA MEDICI 4.0' Technology Modeling Associates Inc., Palo Alto, USA.
  • 12
    • 0027149649 scopus 로고
    • Dependence of breakdown voltage on drift length and buried oxide thickness in SOI RESURF LDMOST transistors
    • Merchant S, Arnold E, Baumgart H, Egloff R, Letavic T, Mukherjee S, et al. Dependence of breakdown voltage on drift length and buried oxide thickness in SOI RESURF LDMOST transistors. In: Proc 5th ISPSD, 1993. p. 124-8.
    • (1993) Proc 5th ISPSD , pp. 124-128
    • Merchant, S.1    Arnold, E.2    Baumgart, H.3    Egloff, R.4    Letavic, T.5    Mukherjee, S.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.