Applying ANN/GA algorithm to optimize the high fill-factor microlens array fabrication using UV proximity printing process

Journal of Micromechanics and Microengineering

Volumn 15, Issue 12, 2005, Pages 2389-2397

  Hung, Shih Yu ^a   Chao, Ching Kong ^b   Lin, Tsung Hung ^b   Lin, Che Ping ^a  

^a NAN KAI UNIVERSITY OF TECHNOLOGY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

GENETIC ALGORITHMS; MACHINE DESIGN; NEURAL NETWORKS; ROBUSTNESS (CONTROL SYSTEMS); SENSITIVITY ANALYSIS; SPIN COATING; ULTRAVIOLET RADIATION;

MANUFACTURING DESIGN; MANUFACTURING PARAMETERS; ROBUST DESIGN; THERMAL REFLOW;

MICROLENSES;

EID: 27944448347     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/15/12/022     Document Type: Article

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