Effects of the Ar-N2 sputtering gas mixture on the preferential orientation of sputtered Ru films

Thin Solid Films

Volumn 494, Issue 1-2, 2006, Pages 240-243

  Kawamura, Midori ^a   Yagi, Kenji ^a   Abe, Yoshio ^a   Sasaki, Katsutaka ^a  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Ar N2 gas mixture; Crystal orientation; Electrical resistivity; Ru film; Sputtering

Indexed keywords

ANNEALING; ARGON; AUGER ELECTRON SPECTROSCOPY; CRYSTAL ORIENTATION; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; MIXTURES; NITROGEN; RUTHENIUM; X RAY DIFFRACTION ANALYSIS;

AR-N2 GAS MIXTURES; RU FILM;

THIN FILMS;

EID: 27844593823     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.130     Document Type: Conference Paper

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