SCOPUS 정보 검색 플랫폼

Solid-State Electronics

Volumn 49, Issue 10, 2005, Pages 1576-1580

Prediction of plasma processes using neural network and genetic algorithm

(2) Kim, Byungwhan a Bae, Jungki a

a Sejong University (South Korea)

Author keywords

Backpropagation neural network; Genetic algorithm; Plasma etching; Statistical experimental design

Indexed keywords

BACKPROPAGATION; COMPUTER NETWORKS; ELECTRIC CURRENTS; GENETIC ALGORITHMS; MATHEMATICAL MODELS; NEURAL NETWORKS; OPTIMIZATION; PLASMA ETCHING; SILICA; STATISTICAL METHODS;

BACKPROPAGATION NEURAL NETWORKS (BPNN); COMPUTER MODELS; PLASMA PROCESSES; STATISTICAL EXPERIMENTAL DESIGN;

PLASMA THEORY;

EID: 27744537729 PISSN: 00381101 EISSN: None Source Type: Journal
DOI: 10.1016/j.sse.2005.08.003 Document Type: Article

Times cited : (26)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.