Qualitative fuzzy logic model of plasma etching process

IEEE Transactions on Plasma Science

Volumn 30, Issue 2 I, 2002, Pages 673-678

  Kim, Byungwhan ^a   Park, Jang Hyun ^b  

^a Sejong University   (South Korea)

^b Korea University   (South Korea)

Author keywords

Adaptive network fuzzy inference system; Experimental design; Fuzzy logic; Plasma etching; Qualitative model; Statistical response surface model

Indexed keywords

ADAPTIVE SYSTEMS; ANISOTROPY; ERROR ANALYSIS; FUZZY SETS; GAIN MEASUREMENT; MAGNETIC FIELDS; PLASMA DEVICES; REACTIVE ION ETCHING;

ADAPTIVE NETWORK FUZZY INFERENCE SYSTEMS (ANFIS); PLASMA DISCHARGES;

PLASMA ETCHING;

EID: 0036545462     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2002.1024269     Document Type: Article

References (6)

1. Modeling plasma equipment using neural networks
2. 4 inductively coupled plasma
3. Reactive ion etch modeling using neural networks and simulated annealing
4. 6 plasma
5. ANFIS: Adaptive-network-based fuzzy inference system