Influence of oxygen on the track etch rate along light ion trajectories in CR-39

Radiation Measurements

Volumn 40, Issue 2-6, 2005, Pages 234-239

  Dorschel B ^a   Hermsdorf, D ^a   Starke, S ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

CR 39; Light ions; Oxidation process; Radical lifetime; Track etch rate

Indexed keywords

DEGASSING; ETCHING; IONS; IRRADIATION; OXYGEN; TRAJECTORIES; VACUUM;

CR-39; LIGHT IONS; OXIDATION PROCESSES; RADICAL LIFETIME; TRACK ETCH RATES;

ELECTRONIC CIRCUIT TRACKING;

EID: 27744516796     PISSN: 13504487     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.radmeas.2004.11.008     Document Type: Conference Paper

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