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Volumn 38, Issue 7 B, 1999, Pages 4496-4499
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Formation of diamond films by intermittent DC plasma chemical vapor deposition using subelectrode
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL STRUCTURE;
ELECTRIC DISCHARGES;
ELECTRIC POWER SUPPLIES TO APPARATUS;
ELECTRODES;
FILM PREPARATION;
MORPHOLOGY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
RAMAN SPECTROSCOPY;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON;
SURFACES;
WAVEFORM ANALYSIS;
ELECTRODE DISTANCE;
INTERMITTENT DISCHARGE;
SUBELECTRODE;
DIAMOND FILMS;
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EID: 0033157533
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.38.4496 Document Type: Article |
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Times cited : (4)
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References (8)
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