Structural changes due to gas pressure of diamond films prepared by intermittent plasma chemical vapor deposition

New Diamond and Frontier Carbon Technology

Volumn 12, Issue 3, 2002, Pages 133-136

  Noda, Mikio ^a   Shimizu, Hideki ^a  

^a AICHI UNIVERSITY OF EDUCATION   (Japan)

Author keywords

Diamond film; Gas pressure; Intermittent discharge; Plasma CVD; Structural change

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRIC BREAKDOWN; ELECTRODES; GRAIN SIZE AND SHAPE; HYDROGEN; IONIZATION; LIGHT EMISSION; METHANE; MIXTURES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; STRUCTURE (COMPOSITION); SUBSTRATES; SYNTHESIS (CHEMICAL);

STRUCTURAL CHANGES;

DIAMOND FILMS;

EID: 0036352944     PISSN: 13449931     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)