High coercivity co-ferrite thin films on SiO2 (100) substrate prepared by sputtering and PLD

IEEE Transactions on Magnetics

Volumn 41, Issue 10, 2005, Pages 3904-3906

  Yin, Jianhua ^a   Ding, Jun ^a   Liu, Binghai ^a   Wang, Yongchao ^a   Yi, Jiabao ^a   Chen, Jingsheng ^b   Miao, Xiangshui ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b DATA STORAGE INSTITUTE   (Singapore)

Author keywords

Co ferrite; High coercivity; Pulsed laser deposition; Sputtering

Indexed keywords

ANNEALING; COERCIVE FORCE; FERRITES; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; PULSED LASER DEPOSITION; SILICA; SINGLE CRYSTALS; SUBSTRATES; THERMAL EFFECTS;

CO-FERRITE THIN FILMS; HIGH COERCIVITY; MICRO-STRAIN;

MAGNETIC THIN FILMS;

EID: 27744514758     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2005.854946     Document Type: Article

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