Micro-electromechanical systems based on 3C-SiC/Si heterostructures

Materials Science and Engineering C

Volumn 25, Issue 5-8, 2005, Pages 804-808

  Forster Ch ^a   Cimalla, V ^a   Bruckner K ^a   Hein, M ^a   Pezoldt, J ^a   Ambacher, O ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Epitaxy; Etching; Microelectromechanical systems; Nanoelectromechanical systems; Silicon; Silicon carbide

Indexed keywords

BIOMEDICAL ENGINEERING; CHEMICAL VAPOR DEPOSITION; EPITAXIAL GROWTH; ETCHING; MICROACTUATORS; MICROELECTROMECHANICAL DEVICES; MICROSENSORS; NANOSTRUCTURED MATERIALS; SILICON CARBIDE; ULTRAHIGH VACUUM;

BIOMOLECULES; HIGH POWER APPLICATIONS; MICRO DOSING; NANOELECTROMECHANICAL SYSTEMS (NEMS);

HETEROJUNCTIONS;

EID: 27744449950     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msec.2005.07.016     Document Type: Article

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