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Volumn , Issue , 2005, Pages 1598-1603
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Development of 3-axis nano stage for precision positioning in lithography system
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Author keywords
3 axis nano stage; Design of experiments; Dynamic characteristics; Flexible mode; Lithography; Magnetic circuit
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Indexed keywords
KINEMATICS;
LITHOGRAPHY;
MAGNETIC CIRCUITS;
DESIGN OF EXPERIMENTS;
DYNAMIC CHARACTERISTICS;
FLEXIBLE MODE;
MECHATRONICS;
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EID: 27744449417
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (20)
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References (6)
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