Characterization of new CD photomask standards

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 29-40

  Mirande W ^a   Bodermann, B ^a   Hassler Grohne W ^a   Frase, C G ^a   Czerkas, S ^a   Bosse, H ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

CD metrology; Photomask standard; SEM; UV transmission microscopy

Indexed keywords

CD METROLOGY; OPTICAL PROXIMITY CORRECTIONS (OPC); PHOTOMASK STANDARDS; UV TRANSMISSION MICROSCOPY;

ALGORITHMS; ATOMIC FORCE MICROSCOPY; CALIBRATION; EDGE DETECTION; ELECTRON BEAM LITHOGRAPHY; IMAGE QUALITY; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; STANDARDS;

MASKS;

EID: 4344566666     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.533734     Document Type: Conference Paper

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