Bi electrodeposition under magnetic field

Electrochimica Acta

Volumn 51, Issue 5, 2005, Pages 897-905

  Motoyama, M ^a   Fukunaka, Y ^a   Kikuchi, S ^b  

^a KYOTO UNIVERSITY   (Japan)

^b UNIVERSITY OF SHIGA PREFECTURE   (Japan)

Author keywords

Bi; Current efficiency; Electrodeposition; Ionic mass transfer; Magnetic field

Indexed keywords

CRYSTAL MICROSTRUCTURE; CURRENT DENSITY; ELECTRODEPOSITION; GALVANIZED METAL; MAGNETOHYDRODYNAMICS; MASS TRANSFER; THIN FILMS;

CURRENT EFFICIENCY; GALVANOSTATICALLY ELECTRODEPOSITED; IONIC MASS TRANSFER;

BISMUTH;

EID: 27644519718     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2005.05.059     Document Type: Conference Paper

References (37)

1. R.N. O'Brien, and K.S.V. Santhanam Electrochim. Acta 32 1987 1679
2. G. Hinds, F.E. Spada, J.M. Coey, T.R. Ní Mhíocháin, and M.E.G. Lyons J. Phys. Chem. B 105 2001 9487
3. I. Mogi, and M. Kamiko J. Cryst. Growth 166 1996 276
4. Y. Fukunaka, Y. Tanaka, E. Kusaka, R. Ishii, I. Mogi, in: Proceedings of the 3rd International Symposium on Electromagnetic Processing of Materials (EPM2000), The Iron and Institute of Japan, 578, (2000).
5. H. Matsushima, T. Nohira, and Y. Ito Electrochim. Acta 49 2004 4181
6. K. Shinohara, and R. Aogaki Electrochemistry 67 1999 126
7. A.J. Davenport, Y.C. Tang, M. Gonzalez-Torreira, S. Yang, and R. Harris Extended Abstracts of the 203rd Meeting of the Electrochemcal Society 2003
8. C.-C. Lee, and T.-C. Chou Electrochim. Acta 40 1995 965
9. L. Yang J. Electrochem. Soc. 101 1954 456
10. A. Chiba, K. Kitamura, and T. Ogawa Surf. Coat. Technol. 27 1986 83
11. M. Tahashi, K. Sassa, I. Hirabayashi, and S. Asai J. Jpn. Inst. Met. 41 2000 985
12. O. Devos, A. Olivier, J.-P. Chopart, O. Aaboubi, and G. Maurin J. Electrochem. Soc. 145 1998 401
13. K.H. Lee, J. Yoo, J. Ko, H. Kim, H. Chung, D. Chang, and J.-Y. Lee Phys. C 372 2002 866
14. H. Matsushima, T. Nohira, I. Mogi, and Y. Ito Surf. Coat. Technol. 179 2004 245
15. H. Matsushima, T. Nohira, and Y. Ito J. Solid State Electrochem. 8 2004 195
16. H. Matsushima, T. Nohira, and Y. Ito Electrochem. Solid State Lett. 7 2004 C81
17. S. Bodea, L. Vignon, R. Ballou, and P. Molho Phys. Rev. Lett. 83 1999 2612
18. S. Bodea, R. Ballou, and P. Molho Phys. Rev. Lett. E 69 2004 21605
19. O. Devos, O. Aaboubi, J.-P. Chopart, and A. Olivier J. Phys. Chem. A 104 2000 1544
20. M. Nambu, T. Iida, E. Kusaka, Y. Fukunaka, R. Ishii, in press.
21. Y. Fukunaka, T. Yamamoto, and Y. Kondo J. Electrochem. Soc. 136 1989 3630
22. Y. Fukunaka, H. Doi, and Y. Kondo J. Electrochem. Soc. 137 1990 88
23. F.Y. Yang, K. Liu, K. Hong, D.H. Reich, P.C. Searson, and C.L. Chien Science 284 1999 1335
24. Z. Zhang, X. Sun, M.S. Dresselhaus, J.Y. Ying, and J.P. Heremans Appl. Phys. Lett. 73 1998 1589
25. K. Liu, C.L. Chien, and P.C. Searson Phys. Rev. B 58 1998 R14681
26. R. Aogaki, K. Fueki, and T. Mukaibo Denki Kagaku 43 1975 509
27. K. Kim, and T.Z. Fahidy J. Electrochem. Soc. 142 1995 4196
28. E. Högfeldtin Stability Constants of Metal-Ion Complexes Part A: Inorganic Ligands 1982 Pergamon Press Oxford
29. K. Denpo, S. Teruta, Y. Fukunaka, and Y. Kondo Metall. Trans. B 14B 1983 633
30. Y. Fukunaka, T. Minegishi, N. Nishioka, and Y. Kondo J. Electrochem. Soc. 128 1981 1274
31. Gmelin Handbuch der Anorganichen Chemie, WISMUT, System-number 19, Verlag Chemie, GMBH, Weinheim/Bergstr, 1964.
32. Gmelin Handbuch der Anorganichen Chemie, CHLOR, System-number 6, Verlag Chemie, GMBH, Weinheim/Bergstr, 1968.
33. Y. Konishi, Y. Fukunaka, and K. Kuribayashi Metall. Mater. Trans. B 30B 1999 779
34. C.B. Ngo Boum, and A. Alemany Electrochim. Acta 44 1999 1749
35. R. Cecchini, J.J. Mallett, and W. Schwarzacher Electrochem. Solid State Lett. 6 2003 C103
36. R. Alkire, and P.-Y. Lu J. Elctrochem. Soc. 126 1979 2118
37. Y. Fukunaka, K. Suzuki, A. Ueda, and Y. Kondo J. Elctrochem. Soc. 136 1989 1002