Control of crystal orientation by imposition of a high magnetic field in a vapor-deposition process

Materials Transactions, JIM

Volumn 41, Issue 8, 2000, Pages 985-990

  Tahashi, Masahiro ^a   Sassa, Kensuke ^a   Hirabayashi, Izumi ^a   Asai, Shigeo ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH; ELECTROMAGNETIC FIELDS; GLASS; LASERS; MAGNETIC FIELD EFFECTS; MAGNETIC PROPERTIES; MAGNETIC SUSCEPTIBILITY; MAGNETIZATION; RADIATION; SUBSTRATES; VAPOR DEPOSITION; ZINC;

ELECTROMAGNETIC PROCESSING OF MATERIALS; HIGH MAGNETIC FIELD; LASER HEAT SOURCE; MAGNETIZATION ENERGY; MAGNETIZATION ENERGY DENSITY; NONMAGNETIC SUBSTANCE; ORIENTATION INDEX;

CRYSTAL ORIENTATION;

EID: 0034245441     PISSN: 09161821     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans1989.41.985     Document Type: Article

References (11)