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Applied Surface Science

Volumn 251, Issue 1-4, 2005, Pages 225-229

Enhanced electron emission from diamond film deposited on pre-seeded Si substrate with nanosized diamond power

(1) Gu, C Z a,b

a NATIONAL INSTITUTE FOR MATERIALS SCIENCE (Japan)

b INSTITUTE OF PHYSICS (China)

Author keywords

Chemical vapor deposition; Diamond film; Field emission; Seeded substrate

Indexed keywords

ANNEALING; CURRENT DENSITY; DEPOSITION; ELECTRON EMISSION; ELECTRON TUNNELING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SYNTHESIS (CHEMICAL);

FIELD EMISSIONS; INTERFACE ENERGY BARRIER; NANO-DIAMOND POWDER; SEEDED SUBSTRATES;

DIAMOND FILMS;

EID: 27544516038 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2005.03.179 Document Type: Conference Paper

Times cited : (6)

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