Amorphous indium tungsten oxide films prepared by DC magnetron sputtering

Journal of Materials Science

Volumn 40, Issue 7, 2005, Pages 1611-1614

  Abe, Y ^a   Ishiyama, N ^a   Kuno, H ^a   Adachi, K ^a  

^a SUMITOMO METAL MINING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRODES; MAGNETRON SPUTTERING; POLYMERS; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

INDIUM-TUNGSTEN-OXIDE; TRANSPARENT ELECTRODES;

AMORPHOUS FILMS;

EID: 27544457754     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-005-0660-5     Document Type: Article

References (11)

1. I. HAMBERG and C. G. GRANQVIST, J. Appl. Phys. 60 (1986) R123.
2. E. ANDO, K. KAWAKAMI, K. MATSUHIRO and Y. MASUDA, Displays Jpn. (1985) 3.
3. C. W. TANG and S. A. VANSLYKE, Appl. Phys. Lett. 51 (1987) 913.
4. B. S. CHIOU, S. T. HSIEH and W. F. WU, J. Am. Ceram. Soc. 77 (1994) 1740.
5. M. INOUE, T. MATSUOKA, Y. FUJITA and A. ABE, Jpn. J. Appl Phys. 28 (1989) 274.
6. CH. JONDA, A.B.R. MAYER, U. STOLZ, A. ELSCHNER and A. KARBACH, J. Mater. Sci. 35 (2000) 5635.
7. Y. SHIGESATO, S. TAKAKI and T. HARANOH, J. Appl. Phys. 71 (1992) 3356.
8. P. K. SONG, Y. SHIGESATO, I. YASUI, C. W. OWYANG and D. C. PAINE, Jpn. J. Appl. Phys. 37 (1998) 1870.
9. S. ISHIBASHI, Y. HIGUCHI, Y. OTA and K. NAKAMURA, J. Vac. Sci. Technol. A8 (1990) 1399.
10. K. INOUE, Idemitsugiho 41 (1998) 89.
11. Y. SHIGESATO, N. SHIN, M. KAMEI, P. K. SONG and I. YASUI, Jpn. J. Appl. Phys. 39 (2000) 6422.