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Volumn 2, Issue 6, 2005, Pages 1963-1967

Effect of carbon on oxygen precipitation in Czochralski silicon

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; INTERFACIAL ENERGY; OXYGEN; PRECIPITATION (CHEMICAL); SILICON;

EID: 27344447953     PISSN: 16101634     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1002/pssc.200460537     Document Type: Conference Paper
Times cited : (19)

References (19)
  • 1
    • 0001673843 scopus 로고
    • edited by S. Mahajan (North Holland, Amsterdam)
    • H. Bender and J. Vanhellemont, in: Handbook of Semiconductors, edited by S. Mahajan (North Holland, Amsterdam, 1994), Vol. 3b, p. 1637.
    • (1994) Handbook of Semiconductors , vol.3 B , pp. 1637
    • Bender, H.1    Vanhellemont, J.2
  • 14
    • 0001230254 scopus 로고    scopus 로고
    • eds K. A. Jackson and W. Schröter, (Wiley-VCH, Weinheim)
    • T. Y. Tan and U. Gösele, in: Handbook of Semiconductor Technology, eds K. A. Jackson and W. Schröter, (Wiley-VCH, Weinheim, 2000), Vol. 1, p. 231.
    • (2000) Handbook of Semiconductor Technology , vol.1 , pp. 231
    • Tan, T.Y.1    Gösele, U.2
  • 19
    • 77956989619 scopus 로고
    • ed. F. Shimura (Academic Press, San Diego)
    • T. Y. Tan and W. J. Taylor, Semiconductors and Semimetals, Vol. 42, ed. F. Shimura (Academic Press, San Diego, 1994), p. 353.
    • (1994) Semiconductors and Semimetals , vol.42 , pp. 353
    • Tan, T.Y.1    Taylor, W.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.