Decomposition of peroxy radicals in SiO2 glass with X-rays or KrF laser light

Physica Status Solidi C: Conferences

Volumn 2, Issue 1, 2005, Pages 314-317

  Kajihara, Koichi ^a   Skuja, Linards ^a,b   Hirano, Masahiro ^a   Hosono, Hideo ^a,c  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b UNIVERSITY OF LATVIA   (Latvia)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; GLASS; LASERS; SILICA;

FRENKEL MECHANISM; SI-O-SI BOND;

X RAYS;

EID: 27344439794     PISSN: 16101634     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1002/pssc.200460173     Document Type: Conference Paper

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