Improvement in the crystalline quality of homoepitaxial diamond films by oxygen plasma etching of mirror-polished diamond substrates

Journal of Crystal Growth

Volumn 285, Issue 1-2, 2005, Pages 130-136

  Yamamoto, Michinori ^a   Teraji, Tokuyuki ^a   Ito, Toshimichi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

A1. Defect; A1. Etching; A2. Epitaxial; A3. Chemical vapor deposition; B1. Diamond; B1. Oxygen plasma

Indexed keywords

CATHODOLUMINESCENCE; CRYSTAL DEFECTS; CRYSTALLINE MATERIALS; ELECTRON CYCLOTRON RESONANCE; EPITAXIAL GROWTH; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; SINGLE CRYSTALS; SUBSTRATES; SYNTHESIS (CHEMICAL);

ELECTRONIC QUALITY; OXYGEN PLASMA; POLISHING PROCESSES; SINGLE-CRYSTALLINE DIAMOND SUBSTRATES;

DIAMOND FILMS;

EID: 27144441082     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.08.019     Document Type: Article

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