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Volumn , Issue , 2005, Pages 451-454

Low-stress, heavily-doped polycrystalline silicon carbide for MEMS applications

Author keywords

[No Author keywords available]

Indexed keywords

ELEVATED TEMPERATURES; LOW-PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD); MICROMACHINED MEMBRANES; TENSILE RESIDUAL STRESS;

EID: 26944464232     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (32)

References (11)
  • 11
    • 26944500424 scopus 로고
    • PhD Thesis, U. C. Berkeley
    • W.C. Tang: PhD Thesis, U. C. Berkeley, 1991.
    • (1991)
    • Tang, W.C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.