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Volumn , Issue , 2005, Pages 451-454
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Low-stress, heavily-doped polycrystalline silicon carbide for MEMS applications
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Author keywords
[No Author keywords available]
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Indexed keywords
ELEVATED TEMPERATURES;
LOW-PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD);
MICROMACHINED MEMBRANES;
TENSILE RESIDUAL STRESS;
CHEMICAL VAPOR DEPOSITION;
DURABILITY;
ELASTIC MODULI;
MICROELECTROMECHANICAL DEVICES;
RESIDUAL STRESSES;
RESONATORS;
SILICON CARBIDE;
SILICON WAFERS;
STRESS ANALYSIS;
POLYSILICON;
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EID: 26944464232
PISSN: 10846999
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (32)
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References (11)
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