Towards a versatile DRIE: Silicon pit structures combined with electrochemical etch stop

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2005, Pages 504-507

  Kurzawski, P ^a   Salo, T ^a   Hierlemann, A ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTROCHEMISTRY; PITTING; SENSORS; SILICON; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS;

ELECTROCHEMICAL ETCHING (ECE); SENSOR ARRAYS; SILICON MEMBRANES;

REACTIVE ION ETCHING;

EID: 26844551736     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

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