Formation of ordered mesostructured silica by vapor infiltration of tetraethoxysilane into hexagonally arranged surfactant-catalyst nanocomposites

Chemistry Letters

Volumn 34, Issue 8, 2005, Pages 1148-1149

  Tanaka, Shunsuke ^a   Maruo, Takanori ^a   Nishiyama, Norikazu ^a   Egashira, Yasuyuki ^a   Ueyama, Korekazu ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 26844531230     PISSN: 03667022     EISSN: None     Source Type: Journal    
DOI: 10.1246/cl.2005.1148     Document Type: Article

References (13)

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12. 3). Small amount of TEOS was placed in the bottom of the vessel apart from the substrate. The vessel was placed in an oven at 90°C for 2 h. Calcination was performed at 400°C in air for 5 h with a heating rate of 1°C/min. The films were identified by X-ray diffraction (XRD) patterns recorded on a Rigaku Mini-flex. Fourier-transform infrared (FTIR) spectra of the films were recorded using a FTIR-8200PC spectrometer (Shimadzu Co.). Field emission scanning electron microscope (FE-SEM) images were recorded on a Hitachi S-5000L microscope.
13. 2 were 0-30 and 30 mL/min, respectively. The films were subsequently calcined in flowing air at 400°C for 5 h to remove the surfactant.