Micro/nano glass press molding using silicon carbide molds fabricated by silicon lost molding

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2005, Pages 475-478

  Min, Kyung Oh ^a   Tanaka, Shuji ^a   Esashi, Masayoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MIRROR SURFACE; NANO GLASS; PRESS MOLDING; SILICON MOLD;

DIAMOND LIKE CARBON FILMS; ETCHING; HIGH TEMPERATURE EFFECTS; MICROOPTICS; MOLDS; NANOSTRUCTURED MATERIALS; NITRIC ACID; PHOTOLITHOGRAPHY; SILICON CARBIDE; SURFACE ROUGHNESS;

MOLDING;

EID: 26844472192     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2005.1453970     Document Type: Conference Paper

References (6)

1. Hiroyuki Maehara and Hiroshi Murakoshi, "Quartz Glass Molding by Precision Glass Molding Method", Trans. IEE Jpn., pp. 494-497, 2002.
2. Yoshizo Komiyama, "The Present Condition of Glass-Molding Press Machine", NEW GLASS, 13, 2, pp. 38-42, 1998.
3. N. Rajan et al, "Fabrication and Testing of Micromachined Silicon Carbide and Nickel Fuel Atomizers for Gas Turbine Engines", J. Microelectromech. Syst., 8, pp. 251-257, 1999.
4. Shuji Tanaka et al., "Silicon Carbide Micro-Reaction-Sintering Using Micromachined Silicon Molds", J. Microelectromech. Syst., 10, pp. 55-61, 2001.
5. K. Bhanumurthy and R. Schmid-Fetzer, "Interface reactions between silicon carbide and metals (Ni, Cr, Pd, Zr)", Composites: Part A, 32, pp. 569-574, 2001.
6. Koji Takahashi et al., "Low-Temperature Growth of 3C-SiC on Si Substrate by Chemical Vapor Deposition Using Hexamethyldisilane as a Source Material" J. Electrochem. Soc., 139, pp. 3565-3571, 1992.