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Volumn 169, Issue 2, 2005, Pages 214-218

Parametric studies on pulsed near ultraviolet frequency tripled Nd:YAG laser micromachining of sapphire and silicon

Author keywords

Ablation threshold; Laser micromachining; Sapphire; Silicon; Ultraviolet laser

Indexed keywords

MICROMACHINING; MORPHOLOGY; PHOTOCHEMICAL REACTIONS; SAPPHIRE; SILICON; SURFACES; ULTRAVIOLET DEVICES; ULTRAVIOLET RADIATION;

ABLATION THRESHOLD; LASER MICROMACHINING; PHOTOCHEMICAL PROCESS; ULTRAVIOLET LASER;

LASER PULSES;

EID: 26444593894 PISSN: 09240136 EISSN: None Source Type: Journal
DOI: 10.1016/j.jmatprotec.2005.03.023 Document Type: Article

Times cited : (72)

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