Micromachining of pulsed laser annealed PECVD SIxGE 1-x deposited at temperatures ≤ 370°C

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2005, Pages 487-490

  Sedky, Sherif ^a,b,c   Witvrouw, Ann ^c  

^a The American University in Cairo   (Egypt)

^b AMERICAN UNIVERSITY IN CAIRO   (Egypt)

^c IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

GROWTH RATE; PULSE FLUENCE; PULSED EXCIMER LASERS; STRUCTURAL LAYERS;

EXCIMER LASERS; MICROMACHINING; MOLECULAR STRUCTURE; PULSED LASER APPLICATIONS; SILICON COMPOUNDS; THERMAL EFFECTS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 26444549928     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2005.1453973     Document Type: Conference Paper

References (12)

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