Fabrication and characterization of three-dimensional Ta2O 5/SiO2 photonic crystals

Nanotechnology

Volumn 15, Issue 5, 2004, Pages 698-702

  Zhang, B P ^a,b   Isoya, G ^a,f   Yasuda, T ^a,c   Ohfuti, Y ^d   Liu, C Y ^a,e   Segawa, Y ^a,b  

^a INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c ISHINOMAKI SENSHU UNIVERSITY   (Japan)

^d UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

^e TONGHUA TEACHERS COLLEGE   (China)

^f Geomatec Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; FABRICATION; LASERS; LIGHT EMITTING DIODES; OPTICAL SWITCHES; PERMITTIVITY; PHOTONS; SILICON COMPOUNDS; SPUTTER DEPOSITION; TANTALUM COMPOUNDS; WAVEGUIDES;

MICROCAVITY LASERS; OPTICAL ANISOTROPIES; PHOTONIC BANDGAP (PBG); PHOTONIC CRYSTALS;

CRYSTALS;

EID: 2642573584     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/15/5/050     Document Type: Article

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