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Volumn 202, Issue 5, 2005, Pages 749-753

Reduction of threading dislocations in GaN overgrowth by MOCVD on TiN porous network templates

Author keywords

[No Author keywords available]

Indexed keywords

IN SITU NITRIDATION; POROUS NETWORKS; ROOM TEMPERATURE; THREADING DISLOCATIONS;

EID: 25444504513     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200461552     Document Type: Conference Paper
Times cited : (8)

References (8)
  • 3
    • 18244391420 scopus 로고    scopus 로고
    • Epitaxial lateral overgrowth of GaN
    • Nitride Semiconductors, edited by P. Ruterana, M. Albrecht, and J. Neugebauer (Wiley-VCH, Weinheim), ISBN: 3-527-40387-6, Chapt. 2
    • See for example, P. Gibart, B. Beaumont, and P. Vennéguès, Epitaxial Lateral Overgrowth of GaN, in: Nitride Semiconductors, Handbook on Materials and Devices, edited by P. Ruterana, M. Albrecht, and J. Neugebauer (Wiley-VCH, Weinheim, 2003), ISBN: 3-527-40387-6, Chapt. 2.
    • (2003) Handbook on Materials and Devices
    • Gibart, P.1    Beaumont, B.2    Vennéguès, P.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.