Quantitative modelling of nucleation kinetics in experiments for poly-Si growth on SiO2 by hot wire chemical vapor deposition

Thin Solid Films

Volumn 458, Issue 1-2, 2004, Pages 67-70

  Mason, Maribeth S ^a   Holt, Jason K ^a   Atwater, Harry A ^a  

^a California Institute of Technology   (United States)

Author keywords

Diffusion on SiO2; Hot wire chemical vapor deposition; Nucleation kinetics

Indexed keywords

ACTIVATION ENERGY; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; DIFFUSION; FILM GROWTH; MONOMERS; NUCLEATION; REACTION KINETICS; SILICA;

CRITICAL DENSITY; HOT-WIRE CHEMICAL VAPOR DEPOSITION; NUCLEATION KINETICS;

POLYSILICON;

EID: 2542492507     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.11.302     Document Type: Article

References (8)

1. Matsumura H. Jpn. J. Appl. Phys. 30:1991;1522.
2. H.N. Wanka, R. Zedlitz, M. Heintze, M.B. Schubert, Proceedings of the 13th EC PVSEC, Nice 428, 1995, p. 1753.
3. Cifre J., Bertomeu J., Puigdollers J., Polo M.C., Andreu J., Lloret A. Appl. Phys. A. 59:1994;645.
4. Wanka H.N., Zedlitz R., Heintze M., Schubert M.B. Mater. Res. Soc. Symp. Proc. 420:1996;915.
5. Thiesen J., Iwaniczko E., Jones K.M., Mahan A., Crandall R. Appl. Phys. Lett. 79:1999;992.
6. Swiatek M., Holt J.K., Goodwin D.G., Atwater H.A. Mater. Res. Soc. Symp. Proc. 609:2000;144.
7. Wanka H.N., Schubert M.B. Mater. Res. Soc. Symp. Proc. 467:1997;651.
8. Venables J.A. Phil. Mag. 27:1973;699.