![]() |
Volumn 609, Issue , 2000, Pages A1921-A1925
|
Manipulation and control of nucleation and growth kinetics with hydrogen dilution in hot-wire CVD growth of poly-Si
a a a a |
Author keywords
[No Author keywords available]
|
Indexed keywords
ATOMIC FORCE MICROSCOPY;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL MICROSTRUCTURE;
ETCHING;
FILM GROWTH;
GRAIN SIZE AND SHAPE;
HIGH TEMPERATURE EFFECTS;
HYDROGENATION;
NUCLEATION;
PRESSURE EFFECTS;
SEMICONDUCTOR GROWTH;
SILANES;
TRANSMISSION ELECTRON MICROSCOPY;
GAS-PHASED KINETICS;
MICROCRYSTALLINE FILMS;
POLYSILICON;
|
EID: 0034429763
PISSN: 02729172
EISSN: None
Source Type: Journal
DOI: 10.1557/proc-609-a19.2 Document Type: Article |
Times cited : (2)
|
References (6)
|