Patterning-free integration of polymer light-emitting diode and polymer transistor

Applied Physics Letters

Volumn 84, Issue 18, 2004, Pages 3558-3560

  Li, Z L ^a   Yang, S C ^a   Meng, H F ^a   Chen, Y S ^a   Yang, Y Z ^b   Liu, C H ^b   Horng, S F ^b   Hsu, C S ^a   Chen, L C ^c   Hu, J P ^d   Lee, R H ^d  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^c DELTA ELECTRONICS INC   (Taiwan)

^d INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ATMOSPHERIC PRESSURE; CARRIER MOBILITY; CROSSLINKING; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; ELECTRIC CURRENTS; ELECTRIC SPACE CHARGE; ELECTROLUMINESCENCE; FIELD EFFECT TRANSISTORS; IONIZATION; LIGHT EMISSION; PHOTOLITHOGRAPHY; PHOTOLUMINESCENCE; POLYSILICON; SCREEN PRINTING;

DRAIN CURRENTS; EMISSION SPECTRA; HOLE-TRANSPORT LAYERS (HTL); INJECTION BARRIERS; IONIZATION POTENTIAL;

LIGHT EMITTING DIODES;

EID: 2542474336     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1728301     Document Type: Article

References (11)

1. M. Kimura, I. Yudasaka, S. Kanbe, H. Kobayashi, H. Kiguchi, S.-I. Seki, S. Miyashita, T. Shimoda, T. Ozawa, K. Kitawada, T. Nakazawa, W. Miyazawa, and H. Ohshima, IEEE Trans. Electron Devices 46, 2282 (1999).
2. J.H. Kim, Y. Hong, and J. Janicki, IEEE Trans. Electron Device Lett. 24, 451 (2003).
3. H. Sirringhaus, P.J. Brown, R.H. Friend, M.M. Nielson, K. Bechgaard, B.M.W. Langeveld-Voss, A.J.H. Spiering, R.A.J. Janssen, E.W. Meijer, P. Herwig, and D.M. de Leeuw, Science 401, 685 (1999).
4. A. Dodabalapur, Z. Bao, A. Makhija, J.G. Laquindanum, V.R. Raju, Y. Feng, H.E. Katz, and J. Rogers, Appl. Phys. Lett. 73, 142 (1998).
5. H. Sirringhaus, N. Tessler, and R.H. Friend, Science 280, 1741 (1998).
6. H. Kobayashi, S. Kanbe, S. Seki, H. Higuchi, M. Kimura, I. Yudasaka, S. Miyashita, T. Shimoda, Ca.R. Towns, J.H. Burroughes, and R.H. Friend, Synth. Met. 111-112, 125 (2000).
7. Z. Bao, Y. Feng, A. Dodabalapur, V.R. Raju, and A.J. Lovinger, Chem. Mater. 9, 1299 (1997).
8. C.D. Muller, A. Falcou, N. Reckefuss, M. Rojahn, V. Wiederhirn, P. Rudati, H. Frohne, O. Nuyken, H. Becker, and K. Meerholz, Nature (London) 421, 829 (2003).
9. Y. Cao, G. Yu, C. Zhang, R. Menon, and A.J. Heeger, Synth. Met. 87, 171 (1997).
10. Trademark of The Dow Chemical Company.
11. M. T. Bernius, M. Inbasekaren, J. O'Brien, and W. Wu, Adv. Mater 12, 1737 (2000).