Domain wall pinning in ferromagnetic structures fabricated by focused ion beam

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 785-789

  Klaui M ^a,d   Vaz, C A F ^a   Lapicki, A ^b   Suzuki, T ^b   Cui, Z ^c   Bland, J A C ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^c RUTHERFORD APPLETON LABORATORY   (United Kingdom)

^d UNIVERSITY OF KONSTANZ   (Germany)

Author keywords

Domain wall pinning; Focused ion beam; Magnetic wires; Notches; Prepatterned silicon

Indexed keywords

ATOMIC FORCE MICROSCOPY; ION BEAMS; MAGNETIZATION; MAGNETORESISTANCE; MOLECULAR BEAM EPITAXY; NUCLEATION; QUANTUM THEORY; REACTIVE ION ETCHING; SENSORS; WAVE PROPAGATION;

DOMAIN WALL PINNING; FOCUSSED ION BEAM; MAGNETIC WIRES; NOTCHES; PREPATTERNED SILICON;

FERROMAGNETIC MATERIALS;

EID: 2542456072     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00221-7     Document Type: Conference Paper

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