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Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 865-875

Nano-fabrication with focused ion beams

(15) Gierak, J a Mailly, D a Faini, G a Pelouard, J L a Denk, P a Pardo, F a Marzin, J Y a Septier, A b Schmid, G c Ferre J d Hydman, R d Chappert, C e Flicstein, J f Gayral, B f Gerard J M f

a CNRS (France)

b Bioinformatique et Chimie Moléculaire (France)

c UNIVERSITY OF DUISBURG ESSEN (Germany)

d UNIVERSITÉ PARIS SUD (France)

e UNIVERSITÉ PARIS SACLAY (France)

f ORANGE LABS (France)

Author keywords

Focused ion beams; Nano fabrication

Indexed keywords

ELECTRON BEAMS; ION BEAMS; LITHOGRAPHY; THIN FILMS; X RAYS;

FOCUSED ION BEAMS (FIB);

NANOSTRUCTURED MATERIALS;

EID: 0035450359 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/S0167-9317(01)00443-9 Document Type: Article

Times cited : (26)

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