The impact of illumination on feature fidelity for CPL mask technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 3, 2005, Pages 1557-1561

  Kuijten, Jan Pieter ^a   Verhappen, Arjan ^a   Conley, Will ^b   Van De Goor, Stefan ^a   Litt, Lloyd ^b   Wu, Wei ^b   Lucas, Kevin ^b   Roman, Bernie ^b   Kasprowicz, Bryan ^c   Progler, Chris ^c   Socha, Robert ^d   Van Den Broeke, Doug ^d   Wampler, Kurt ^d   Laidig, Tom ^d   Hsu, Stephen ^d  

^a ASML   (Netherlands)

^b FREESCALE SEMICONDUCTOR INC   (United States)

^c PHOTRONICS INC   (United States)

^d ASML US Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COMPUTER SIMULATION; FLUORINE; IMAGE ANALYSIS; MASKS; NANOTECHNOLOGY; PHOTORESISTS;

CPL MASK TECHNOLOGY; IMAGE LINES; NUMERICAL APERTURE (NA); TEST STRUCTURES;

LIGHTING;

EID: 25144451247     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.605481     Document Type: Conference Paper

References (3)

1. J. F. Chen, J. S. Petersen, R. Socha, T. Laidig, K. E. Wampler, K. Nakagawa, G. Hughes, S. MacDonald, W. Ng, "Binary Halftone Chromeless PSM Technology for Quarter Wavelength Lithography", SPIE Paper 4346-51, Santa Clara, CA (2001)
2. Matsuo, et al., "Feasibility Study of an Embedded Transparent Phase-Shifting Mask", SPIE, Vol 4000, pp. 443-451 (2000)
3. Will Conley, Jan Pieter Kuijten, Arjan Verhappen, et al, "Line End Shortening in CPL Mask Technology", MNE, MEE4216, Rotterdam (2004)