The fabrication process and characteristics of light loss free zero-space microlenses for CMOS image sensor

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 2, 2005, Pages 1241-1248

  Lee, Sang Uk ^a   Park, Jeong Lyeol ^a   Choi, Jae Sung ^a   Lee, Jeong Gun ^a  

^a MagnaChip Semiconductor Ltd   (South Korea)

Author keywords

CMOS image sensor; Dead space; Light loss; Zero space microlenses

Indexed keywords

CMOS INTEGRATED CIRCUITS; FABRICATION; IMAGE QUALITY; IMAGE SENSORS; LIGHT SOURCES; OPTICAL SYSTEMS; PHOTORESISTS;

CMOS IMAGE SENSORS; DEAD SPACE; LIGHT LOSS; ZERO SPACE MICROLENSES;

MICROLENSES;

EID: 25144446207     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600383     Document Type: Conference Paper

References (6)

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6. Douglas A. Baillie et al., "Zero-space microlenses for CMOS image sensors: optical modeling and lithographic process development," Optical Microlithography XVII, Bruce W. Smith, eds., pp. 953-959, Proceedings of SPIE vol. 5377, 2004.