Dynamic sequential layer-by-layer deposition method for fast and region-selective multilayer thin film fabrication

Langmuir

Volumn 21, Issue 18, 2005, Pages 8532-8538

  Kim, Hyong Jun ^a   Lee, Kangwon ^a   Kumar, Sameer ^a   Kim, Jinsang ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MULTILAYER FILMS; PROCESSING PARAMETERS; THIN FILM FABRICATION;

CONCENTRATION (PROCESS); ELECTRODEPOSITION; FLUIDIC DEVICES; MULTILAYERS; POLYELECTROLYTES; SUBSTRATES;

THIN FILMS;

ADSORPTION; ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL MODEL; CHEMICAL STRUCTURE; SPECTROSCOPY; SURFACE PROPERTY; TIME;

ADSORPTION; MICROSCOPY, ATOMIC FORCE; MODELS, CHEMICAL; MOLECULAR STRUCTURE; SPECTRUM ANALYSIS; SURFACE PROPERTIES; TIME FACTORS;

EID: 24944576611     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0511182     Document Type: Article

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