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Volumn 21, Issue 4, 2005, Pages 315-319

Particle induced X-ray emission spectroscopic (PIXE) and surface morphological (AFM) studies on electron beam evaporated WO3 thin films

(5) Sivakumar, R a Ganesan, V b Vijayan, V c Jayachandran, M d Sanjeeviraja, C a

a ALAGAPPA UNIVERSITY (India)

b UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH (India)

c INSTITUTE OF PHYSICS (India)

d CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE (India)

Author keywords

Annealing; Atomic force microscopy; Crystallite size; Diffusion kinetics; Electrochromism; Electron beam evaporation; Elemental analysis; Heat treatment; Nanocrystallinity; PIXE; Proton beam; Substrate temperature; Surface morphology; Tungsten oxide films

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; EVAPORATION; GLASS; SUBSTRATES; TUNGSTEN COMPOUNDS; X RAY SPECTROSCOPY;

FLUORINE DOPED TIN OXIDE (FTO); GLASS SUBSTRATES; NANOGRAINS;

THIN FILMS;

EID: 24944575598 PISSN: 02670844 EISSN: None Source Type: Journal
DOI: 10.1179/174329405X55357 Document Type: Article

Times cited : (2)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.