Electrodeposition and properties of NiW films for MEMS application

Electrochimica Acta

Volumn 50, Issue 28, 2005, Pages 5573-5580

  Slavcheva, E ^a   Mokwa, W ^a   Schnakenberg, U ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Electrodeposition; MEMS; NiW

Indexed keywords

COMPLEXATION; CONCENTRATION (PROCESS); ELECTROLYTES; ELECTROPLATING; MICROSTRUCTURE; NICKEL COMPOUNDS; PH EFFECTS;

INTERNAL STRESS; MEMS; NICKEL SULPHAMATE; NIW;

METALLIC FILMS;

EID: 24944501634     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2005.03.059     Document Type: Article

References (27)

1. A. Brenner Electrodeposition of Alloys, Principles and Practice vol. I-II 1963 Academic Press New York
2. M.M. Younan, and M. Shoeib Galvanotechnik 86 4 2002 932
3. D.E. Kranz Galvanotechnik 89 1997 1506 ff
4. A.F. Holleman, and N. Wieberg Inorganic Chemistry 1985 Walter De Gruyter Berlin, New York
5. O. Younes, and E. Gileady J. Electrochem. Soc. 149 2 2002 C100
6. Th. Fritz, W. Mokwa und, and U. Schnakenberg Galvanotechnik 92 8 2002 2108
7. T. Yamasaki, P. Schlossmacher, K. Ehrlich, and Y. Ogino Nanostruct. Mater. 10 3 1998 375
8. P. Schlossmacher, and T. Yamasaki Microchim. Acta 132 2000 309
9. C. Krueger, W. Mokwa, and U. Schnakenberg Proceedings of 17th Conference MEMS Maastricht, Netherlands, 23-25 January 2004 117
10. Th. Friz, Ph.D. Thesis, Aachen University, 2002.
11. C. Krueger, Ph.D. Thesis, Aachen University, 2004.
12. Th. Fritz, W. Mokwa, and U. Schnakenberg Galvanotechnik 92 10 2002 2684
13. N. Atanasov, K. Gencheva, and M. Bratoeva Plat. Surf. Finish. 84 2 1997 67
14. M. Bratoeva, K. Gencheva, T. Tsatscheva, and N. Atanasov Galvanotechnik 54 2000 10
15. M. Bratoeva, and N. Atanasov Met. Finish. 96 1998 92
16. H.P. Klug L. Alexander X-Ray Procedures for Polycrystalline and Amorphous Materials 1980 Wiley/Interscience New York
17. M. Donten, H. Cesiulis, and Z. Stojek Electrochem. Acta 45 2000 3389
18. H. Cesiulis, A. Baltutiene, M. Donten, and Z. Stojek J. Solid State Electrochem. 6 2002 237
19. Y. Wu, D. Chang, D. Kim, and S. Kwon Surf. Coat. Technol. 173 2003 259
20. O. Younes, and E. Gileadi Electrochem. Solid State Lett. 3 12 2000 543
21. T.A. Alekhina, I.A. Shoshina, and A.L. Rotinyan J. Anal. Chem. 11 1990 2419
22. M. Obradovic, J. Stevanovic, R. Stevanovic, and A.R. Despic J. Electroanal. Chem. 491 2000 188
23. M.M. Jaksic Int. J. Hydrogen Energy 26 2001 559
24. B.N. Maruthi, L. Ramesh, S.M. Mayanna, and D. Landolt Plat. Surf. Finish. 86 3 1999 85
25. L. Zhu, O. Younes, N. Ashkenasy, Y. Shacham-Diamand, and E. Gileadi Appl. Surf. Sci. 200 2002 1
26. T. Fritz, W. Mokwa, and U. Schnakenberg Microsyst. Technol. 9 2002 87
27. T. Fritz, M. Griepentrog, W. Mokwa, and U. Schnakenberg Electrochim. Acta 48 2003 3029