Bi induced step-flow growth in the homoepitaxial growth of Au(1 1 1)

Applied Surface Science

Volumn 252, Issue 2, 2005, Pages 364-371

  Kamiko, M ^a   Mizuno, H ^a   Chihaya, H ^a   Xu, J H ^b   Kojima, I ^b   Yamamoto, R ^a  

^a INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Bismuth; Epitaxy; Gold; MBE; Metallic films; RHEED; Surface structure

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; DEPOSITION; DIFFUSION; EPITAXIAL GROWTH; GOLD COMPOUNDS; METALLIC FILMS; MOLECULAR BEAM EPITAXY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SURFACE ACTIVE AGENTS; SURFACE STRUCTURE; SURFACES; TEMPERATURE DISTRIBUTION;

HOMOEPITAXIAL GROWTH; SURFACE DIFFUSION;

BISMUTH;

EID: 24644514911     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.01.015     Document Type: Article

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