Simultaneous UV embossing method for fabricating two parallel organic layers with different hydrophilicity

Microelectronic Engineering

Volumn 82, Issue 1, 2005, Pages 1-11

  Park, Yong Young ^a   Cho, Hansol ^b   Son, Young Mok ^b   Park, Joon Yong ^b   Pu, Lyongsun ^b   KeeYoon, Sang ^c   Hong, Yoon Shik ^c   Lee, Hyun Kee ^d  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b Materials and Devices Research Center   (South Korea)

^c Samsung Electro Mechanics   (South Korea)

^d RD Division Choongwae Pharma C   (South Korea)

Author keywords

Barrier rib; Hydrophilicity; Ink jet; Protrusion; UV embossing

Indexed keywords

FLAT PANEL DISPLAYS; IMAGE QUALITY; INK; LIGHT EMISSION; LIQUID CRYSTAL DISPLAYS; SURFACE PROPERTIES;

BARRIER RIBS; INK-JET; PROTRUSION; UV EMBOSSING;

HYDROPHILICITY;

EID: 24644509766     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.02.008     Document Type: Article

References (18)

1. V.G. Chigrinov Liquid Crystal Devices: Physics and Applications 1999 Artech House Boston
2. J. Shinar, and V. Savvateev Introduction to organic light-emitting devices J. Shinar Organic Light-emitting Devices, a Survey 2004 Springer-Verlag New York
3. M. Grove, D. Hayes, R. Cox, D. Wallace, J. Caruso, M. Hampden-Smith, T. Kodas, K. Kunze, A. Ludviksson, S. Pennino, D. Skamser, in: Proceedings, Display Works '99, San Jose, Feb., 1999.
4. O. Mamoru, Y. Yuji, S. Michiaki, NEC, Jap. Patent (2001) 042313A.
5. S. Shoji, T. Hideaki, Y. Ryuichi, S. Masaji, O. Takeshi, Canon Inc., Jap. Pat. (2000) 089022A.
6. M. Fleuster, M. Klein, P.v. Roosmalen, A.d. Wit, and H. Schwab SID Symp. Digest 35 2004 1276
7. B.-J. de Gans, P.C. Duineveld, and U.S. Shubert Adv. Mater. 16 2004 203
8. S.Y. Chou, P.R. Krauss, and P.J. Renstrom Appl. Phys. Lett. 67 1995 3114
9. H. Schulz, and H.-C. Scheer Microelectron. Eng. 56 2001 311
10. H. Schift, and L.J. Heyderman Nanorheology - squeeze flow in hot embossing of thin films C.M. Sotomayor Torres Alternative Lithography - Unleashing the Potentials of Nanotechnologys 2004 Kluwer Academic Publishers London
11. R.B. Bird, R.C. Armstrong, and O. Hassager Dynamics of polymeric liquids Second ed. Fluid Mechanics vol.1 1987 Wiley New York
12. S. Middleman Fundamentals of Polymer Processing 1977 McGraw-Hill New York
13. R. Probstein Physicochemical Hydrodynamics, an Introduction 1994 Wiley New York
14. S.A. MeAuley Silicon micromachining using a high-density plasma source J. Phys. D: Appl. Phys. 34 2001 2769
15. A. Rickard et. al., Characterisation and optimisation of deep dry etching for mems applications', in: SPIE Int'l Conf. on Microelectronic & MEMS Technologies, Edinburgh (UK), May 2001, 1.
16. S. Wolf, and R.N. Tauber Silicon processing for the VLSI Era Process Technology vol. 1 1986 Lattice Press USA
17. M. Morra, and C. Cassinelli Biomed. Mater. Res. 29 1995 39
18. T. Kawase, H. Sirringhaus, R.H. Friend, and T. Shimoda Adv. Mater. 13 2001 1601