Proof-of-concept tool development for Projection Mask-Less Lithography (PML2)

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 355-365

  Doering, Hans Joachim ^a   Elster, Thomas ^a   Heinitz, Joachim ^a   Fortagne, Olaf ^a   Brandstaetter, Christoph ^b   Haugeneder, Ernst ^b   Eder Kapl, Stefan ^c   Lammer, Gertraud ^c   Loeschner, Hans ^c   Reimer, Klaus ^d   Eichholz, Joerg ^d   Saniter, Juergen ^e  

^a Vistec Electron Beam GmbH   (Germany)

^b BioControl Jena GmbH   (Germany)

^c IMS NANOFABRICATION AG   (Austria)

^d FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

^e FRAUNHOFER HEINRICH HERTZ INSTITUTE   (Germany)

Author keywords

Blanking aperture array; Electron beam optics; Mask less lithography; ML2; Programmable aperture plate

Indexed keywords

DATA COMMUNICATION EQUIPMENT; ELECTRIC LINES; ELECTRON BEAMS; OPTICAL DATA PROCESSING; SCANNING; WSI CIRCUITS;

BLANKING APERTURE ARRAYS; ELECTRON BEAM OPTICS; MASK-LESS LITHOGRAPHY; ML2; PROGRAMMABLE APERTURE PLATES;

PHOTOLITHOGRAPHY;

EID: 24644507829     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600458     Document Type: Conference Paper

References (4)

1. L. Pain, et al., "Advanced patterning studies using shaped E-Beam Lithography for 65nm CMOS pre-production", Proc. SPIE Microlithography 2003, Emerging Technologies VII, Vol. 5037, pp. 560-571 (2003)
2. L. Pain, et al., "65nm Device Manufacturing using Shaped E-Beam Lithography", presented at 2004 International Microprocess and Nanotechnology Conference, Osaka, Japan; to be published in special issues of JJAP on Microprocess and Nanotechnology
3. 3 - Journal of Microlithography, Microfabrication and Microsystems, Vol. 2(1), pp. 34-48 (Jan 2003)
4. th SPIE International Symposium on Microlithography, Emerging Lithographic Technologies VIII; Proc. SPIE Vol. 5374, 64 (2004).