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Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 498-501

New pathways in plasma nitriding of metal alloys

Author keywords

Deuterium effect; Oxygen effect; Plasma nitriding

Indexed keywords

ABSORPTION; DEUTERIUM; HYDROGEN; INDENTATION; NITRIDING; OXIDATION; OXYGEN; PLASMA APPLICATIONS; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 24644479621     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.02.089     Document Type: Article
Times cited : (23)

References (19)
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  • 13
    • 24644482566 scopus 로고    scopus 로고
    • revision U, December Varian Vacuum Tech., Lexinton, Mass., USA
    • Multi-Gauge Controller, Manual 6999-08-091, revision U, December 1998, Varian Vacuum Tech., Lexinton, Mass., USA.
    • (1998) Multi-Gauge Controller, Manual 6999-08-091
  • 15
    • 24644506100 scopus 로고    scopus 로고
    • Phys. J. Chem. Ref. Data, Monograph 9 Fourth Ed
    • M.W. Chase Jr. NIST-JANAF Thermochemical Tables, Phys. J. Chem. Ref. Data, Monograph 9, Parts I and II Fourth Ed. 1998
    • (1998) NIST-JANAF Thermochemical Tables , Issue.PART I-II
    • Chase Jr., M.W.1
  • 17
    • 24644504676 scopus 로고    scopus 로고
    • Processo de Modificação de superficies metálicas por plasma de nitrogênio e deutério
    • Fernando Alvarez e Carlos Alejandro Figueroa, Brazilian Patent, Instituto Nacional de Propriedade Industrial (INPI), 16-10-03, 10:27 hs, Protocolo #5.030
    • Processo de Modificação de superficies metálicas por plasma de nitrogênio e deutério, Fernando Alvarez e Carlos Alejandro Figueroa, Brazilian Patent, Instituto Nacional de Propriedade Industrial (INPI), 16-10-03, 10:27 hs, Protocolo #5.030.
  • 19
    • 0004270702 scopus 로고
    • Fourth Edition New York, USA: McGraw-Hill, Inc
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    • (1995) Physical Chemistry , vol.824
    • Levine, I.N.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.