Influence of the ion mean free path and the role of oxygen in nitriding processes

Journal of Applied Physics

Volumn 94, Issue 4, 2003, Pages 2242-2247

  Figueroa, C A ^a   Ochoa, E ^a   Alvarez, F ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CURRENT DENSITY; HARDNESS; ION IMPLANTATION; OXYGEN; PARTIAL PRESSURE; SCATTERING;

ION MEAN FREE PATH;

NITRIDING;

EID: 0041823765     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1591415     Document Type: Article

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