Formation of niobium oxynitrides by rapid thermal processing (RTP)

Applied Surface Science

Volumn 252, Issue 1 SPEC. ISS., 2005, Pages 205-210

  Matylitskaya, V A ^a   Bock, W ^b   Thoma, K ^c   Kolbesen, B O ^a  

^a GOETHE UNIVERSITY   (Germany)

^b University of Koblenz Landau   (Germany)

^c UNIVERSITY OF KASSEL   (Germany)

Author keywords

Niobium oxynitride; Rapid thermal processing (RTP); SIMS depth profile; Thin films; X ray diffraction (XRD)

Indexed keywords

CRACK INITIATION; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SINGLE CRYSTALS; SPUTTERING; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

NIOBIUM OXYNITRIDES; NITRIDATION; RAPID THERMAL PROCESSING (RTP); SIMS DEPTH PROFILE;

NIOBIUM COMPOUNDS;

EID: 24644475244     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.01.119     Document Type: Conference Paper

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