Laboratory LPP EUV reflectometer working with non-polarized radiation

Applied Surface Science

Volumn 252, Issue 1 SPEC. ISS., 2005, Pages 57-60

  Van Loyen, Ludwig ^a   Böttger, Thomas ^a   Schädlich, Stefan ^a   Braun, Stefan ^a   Foltyn, Thomas ^a   Leson, Andreas ^a   Scholze, Frank ^b   Müllender, Stephan ^c  

^a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^c CARL ZEISS SMT AG   (Germany)

Author keywords

At wavelength characterization; Extreme ultraviolet; Lithography; Metrology; Reflectometry

Indexed keywords

GOLD; LASER APPLICATIONS; LITHOGRAPHY; MEASUREMENTS; REFLECTOMETERS; SYNCHROTRON RADIATION;

EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET REFLECTOMETER (EUVR); WAVELENGTH RANGE;

ULTRAVIOLET DEVICES;

EID: 24644470045     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.01.113     Document Type: Conference Paper

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