Development of beam-tilt angle calibration method for CD-SEM

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue III, 2005, Pages 1353-1361

  Setoguchi, Katsumi ^a   Morokuma, Hidetoshi ^a   Miyamoto, Atsushi ^b   Tanaka, Maki ^b  

^a HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

^b HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CALIBRATION; DIMENSIONAL STABILITY; ELECTRON BEAMS; ERRORS; ESTIMATION; IMAGE PROCESSING;

ANISOTROPIC ETCHING; BEAM-TILT ANGLE CALIBRATION METHOD; CRITICAL DIMENSION (CD); QUANTITATIVE ESTIMATION;

SCANNING ELECTRON MICROSCOPY;

EID: 24644458626     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.602010     Document Type: Conference Paper

References (7)

1. International Technology Roadmap for Semiconductors 2003, Metrology (2003).
2. International SEMATECH : Advanced Process Control Framework Initiative (APCFI) Project : Overview : Technology Transfer #99053735A-TR, (1999).
3. M. Tanaka et al.: New technique to reconstruct effective 3D profile from tilt images of CD-SEM : Proc. of SPIE, Vol.5375, (2004) 1144-1155
4. Thomas Marschner et al.: Characterisation of 193nm Resist Layers by CD-SEM Sidewall Imaging : Proc. of SPIE Vol.5038, (2003) 892-900.
5. H. Morokuma et al.: New technique to reconstruct effective 3D profile from tilt images of CD-SEM : Proc. of SPIE Vol.5375, (2004) 727-734.
6. Hough P. V. C.: Method and Means for Recognizing Complex Patterns : U.S. Patent 3069654, (1962).
7. A.Miyamoto et al. : Development of Beam-tilt Angle Estimation Technique for CD-SEM : Proc. of ViEW, (2004) 48-53